Sputter-Coater

• Stainless Steel box chamber size: Ø300mm, 400mm high
• Front loading for easy access into the chamber
• Resistive, electron-beam, DC and RF sputtering combination possible
• Standard oil free Membrane and Turbo pump system
• Extra free CF160 (8"OD) and CF35 (2.75"OD) ports built into the side wall
• Full range of accessories for thermal resistance, electron beam and RF/DC sputtering
• Optional substrate heating, rotation, cooling, RF biasing or glow discharge cleaning
• Film thickness monitoring and/or process control

Tectra enlarges it’s successful range of small high vacuum coating systems by the ‚Sputter Coater‘. Besides the Mini Coater which is dedicated for thermal and e-beam evaporation the Sputter Coater serves the applications where also magnetron sputter deposition is also required. Because of it's modular design and very flexible configuration possibilities it's an ideal research and development tool with easy possibility to adapt the sytem to frequent changing of R&D subjects.

pdf version of Sputter Coater data sheet (125kB) 

The Sputter Coater allows the major vacuum thin film coating techniques:

• thermal evaporation (boat evaporation or crucible)
• electron beam evaporation (details see e-flux mini e-beam evaporator)
• sputter deposition
  

This makes the Sputter Coater a very versatile system with utmost flexibility in deposition modes and for different sample sizes and shapes.

Sputter coater bottom plate showing sputter magnetron (top), mini e-beam evaporator (left) and thermal boat evaporator (bottom).

Due to it’s open design regarding the sample holder a wide variety of samples from several mm up to about Ø250mm can be coated. Sample holder for multiple samples can easily be considered. Further, a very big CF160 (8“OD) flange on the top position allows special sample holder systems with e.g. rotation, heating, cooling, biasing etc. even to be retrofitted by the customer.   

The Sputter Coater has a 300mm quick access door which opens the full inner diameter of the vacuum chamber. Besides easy and quick sample and target exchange there are no space limitations for all kind of additions and amendments according to changing research or deposition tasks.

On the circumference of the Sputter-Coater chamber there are as standard 5 CF40 (2.75“OD) flanges provided. Typical extensions are: quartz microbalance, leak valve for sputter gas, current/thermocouples etc.. Other flange configurations are possible  on special request.

The standard pumping system consists of a 260l/s turbo molecular pump with oil free membrane pump. Vacuum gauging is accomplished by a full range gauge. The entire Sputter Coater is mounted on a 19“ rack with roller casters. According to the deposition techniques mostly a side rack has to be considered.

The Sputter Coater is a modular system which can be tailored to customer’s application. Please contact us for further discussion.

     

Sputter magnetron with Argon plasma

                    Inner view showing sputter magnetron, mini e-beam evaporator, boat evaporator, plasma cleaner and sample holder platform.

Sputter Coater with built-in motorised sample rotation
and quartz microbalance

Optional sample heater

sample heater at ca. 800°C

sample heater at ca. 950°C

Specification:

            
In the interest of continuous development specification may change without prior notice.