Film thickness measurement systems based on the spectrophotometry are featured in availabilityof non-contact and non-destructive measurements of high reproducibility. These systems are widely used in different fields including the semiconductor and electronic optical material industries. Otsuka Electronics have been supplying sites of researches, quality management and production with original spectral reflectance (VIS region, relative reflectance) film thickness measurement systems with availability of high-speed detection by the multi-channel (PDA, CCD) detectors and also multi-functionality using the optical fibers added. The system developed this time has the measurement wavelength range extended down to the UV region. Further, the system is provided with the additional functions such as non-linear thin film analysis algorithm, micro spot absolute reflection spectrum measurement, and correction and verification using standard samples.

Extension of the measurement wavelengths down to the UV region has brought about improvement of the measurement accuracy of thinner films. In addition, film quality analysis (n: Refractive index, k: Extinction coefficient) has been enabled. As a result, correctness and multi-functionality have been added to conventional features. Traceability system has also been intensified. Micro-region measurement specification system with a microscope and macro-region measurement specification system with optical fiber are available as needed.
 
 

Applications:

FPD

• LCD              ITO/Glass, Pi/Glass, CF/Glass, Resist/Glass
• TFT               SiN/a-Si/Glass
• Organic EL  OLED/ITO/Glass

• Semiconductor  SiO2/Si, Resist/Si, SiO2/a-Si/SiO2, SiO2/SiN/SiO2

• Semiconductor laser        a-Si/GaAs, Al2O3/GaAs, a-Si/Ai2O3/GaAs, AlN/GaAs, ZnO/SiO2/GaAs, AlxGa1-xAs/GaAs,InxGa1-xAs/GaAs, AlxGa1-xAs/InxGa1-xAs/GaAs
• Ferroelectric substance    PZT/Pt

• DVD                      ZnS/SiO2/Polycarbonate
• Magnetic head     DLC/Si, DLC/a-Si/AlTiC

• Filter                      TiO2/Glass, Ta2O5/Glass, WO3/Glass, SiO2/TiO2/SiO2/Glass
• Anti-reflection       Acryl/Glass

• AR film                   AR film/PET

• Construction material      Anti-reflection film/Acryl, TiO2/HC/Acryl

Features:

• Microscopic reflection spectra can be measured in ultraviolet and visible wavelength regions.
• Coping with measurements of multi-layer films and transparent substrates because of loading of the non-linear minimum square method thin film analysis software
• Absolute reflectance measurement, multi-layer film thickness analysis, thin film physical property analysis (refractive index and extinction coefficient)
• High-accuracy measurement realized with back reflection correction
• Analysis of diversified samples through measurements over an extensive wavelength region (190~1100nm)